%0 Journal Article
%T Spectroscopic-ellipsometric study of native oxide removal by liquid phase HF process
%A Anil Sudhakar Kurhekar
%A and Prakash R Apte
%J International Nano Letters
%D 2013
%I 
%R 10.1186/2228-5326-3-10
%X Ex situ spectroscopic ellipsometry (SE) measurements have been employed to investigate the effect of liquid-phase hydrofluoric acid (HF) cleaning on Si<100> surfaces for microelectromechanical systems application. The hydrogen terminated (H-terminated) Si surface was realized as an equivalent dielectric layer, and SE measurements are performed. The SE analyses indicate that after a 20-s 100:5 HF dip with rinse, the Si (100) surface was passivated by the hydrogen termination and remained chemically stable. Roughness of the HF-etched bare Si (100) surface was observed and analyzed by the ex-situ SE. Evidence for desorption of the H-terminated Si surface layer is studied using Fourier transform infrared spectroscopy and ellipsometry, and discussed. This piece of work explains the usage of an ex situ, non-destructive technique capable of showing state of passivation, the H-termination of Si<100> surfaces.
%K Silicon<100>
%K Spectroscopy
%K Ellipsometry
%K Native oxide removal
%K FTIR
%K Cleavage
%K MEMS
%U http://www.inl-journal.com/content/3/1/10/abstract