%0 Journal Article
%T Microstructure and Mechanical Properties of Nanocrystalline Tungsten Thin Films<br>
%A HL Sun
%A ZX Song
%A DG Guo
%A F Ma
%A KW Xu State Key Laboratory for Mechanical Behavior of Materials
%A School of Materials Science
%A Engineering
%A Xi an Jiaotong University
%A Xi'an
%A China
%A <br>
%J 材料科学技术学报
%D 2010
%I 
%X Tungsten (W) thin films were prepared by magnetron sputtering onto Si (100) substrates. Their microstructures were characterized by X-ray diffraction (XRD), field emission scanning electron microscopy (FE-SEM) and transmission electron microscopy (TEM). The hardness and modulus were evaluated by nanoindentation. It is found that a 30 nm Cr sticking layer induces structure changes of deposited W film from β-W to α-W structure. In addition, remarkable hardness enhancement both for the deposited and annealed W films, were compared with that of bulk coarse-grained W, although their nanoindentation modulus is very close to that of corresponding bulk W. The intrinsic reasons that lead to structure changes and super hardness are discussed.
%K Tungsten film
%K Microstructure
%K Nanoindentation
%K Hardness
%K Modulus<br>
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=324DC3CAB22330DB19158AE0A9B7BFA5&aid=F2D71985BFEFE044E64FD287AF1D00D6&yid=140ECF96957D60B2&vid=96C778EE049EE47D&iid=CA4FD0336C81A37A&sid=117F81797AB182FC&eid=08805F9252973BA4&journal_id=1005-0302&journal_name=材料科学技术学报&referenced_num=0&reference_num=27