%0 Journal Article
%T Fabrication of array of one-dimensional porous silicon photonic crystal<br>应用于中红外波段的阵列化多孔硅一维光子晶体的制备
%A MIAO Feng-Juan
%A TAO Bai-Rui
%A CHU Jun-Hao
%A <br>苗凤娟
%A 陶佰睿
%A 褚君浩
%J 红外与毫米波学报
%D 2012
%I Science Press
%X With the aid of photolithography, arrays of one-dimensional porous silicon photonic crystals with the middle infrared mid-gap (λ=5、6、7、10 μm) were fabricated successfully by the combination of microelectronic technique and the electrochemical etching method. For practical use, the roughness of the surface was improved by depositing a Si3N4 thin film with 5000 A°. Then their optical and roughness properties were characterized by FTIR and AFM, respectively. As a result of the synergetic effects rendered by heat isolation and high reflection properties, the array of the one-dimensional porous silicon photonic crystal exhibits feasibility as the substrate for pyroelectric infrared sensor.
%K anodic oxidation
%K one dimension photonic crystal array
%K heat insulation substrate
%K FTIR<br>阳极氧化
%K 阵列化一维光子晶体
%K 快速热氧化
%K 傅里叶红外反射谱(FTIR)
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=D3B4F771D1A06062008B4D0A2EF05996&aid=7A325AF54FF453A44942979871DA1960&yid=99E9153A83D4CB11&vid=4AD960B5AD2D111A&iid=E158A972A605785F&sid=A2745AA1110798CA&eid=C2F76551C0111538&journal_id=1001-9014&journal_name=红外与毫米波学报&referenced_num=0&reference_num=11