%0 Journal Article
%T Review on Micro- and Nanolithography Techniques and Their Applications
%A Alongkorn Pimpin
%A Werayut Srituravanich
%J Engineering Journal
%D 2012
%I Chulalongkorn University
%R 10.4186/ej.2012.16.1.37
%X This article reviews major micro- and nanolithography techniques and their applications from commercial micro devices to emerging applications in nanoscale science and engineering. Micro- and nanolithography has been the key technology in manufacturing of integrated circuits and microchips in the semiconductor industry. Such a technology is also sparking a magnificent transformation of nanotechnology. The lithography techniques including photolithography, electron beam lithography, focused ion beam lithography, soft lithography, nanoimprint lithography and scanning probe lithography are discussed. Furthermore, their applications are reviewed and summarized into four major areas: electronics and microsystems, medical and biotech, optics and photonics, and environment and energy harvesting.
%K Nanolithography
%K photolithography
%K electron beam lithography
%K focused ion beam lithography
%K soft lithography
%K nanoimprint lithography
%K scanning probe lithography
%K dip-pen lithography
%K microsystems
%K MEMS
%K nanoscience
%K nanotechnology.
%U http://engj.org/index.php/ej/article/view/179