%0 Journal Article %T Photocuring Behaviors of UV-Curable Perfluoropolyether-Based Fluoropolymers with and without Tertiary Amine %A Jung-Dae Cho %A Dong-Pyo Kim %A Jin-Who Hong %J Open Journal of Organic Polymer Materials %P 6-9 %@ 2164-5752 %D 2014 %I Scientific Research Publishing %R 10.4236/ojopm.2014.41002 %X
UV-curable perfluoropolyether (PFPE)-based fluoropolymer (PFPE-DMA) was synthesized and the photocuring behaviors of PFPE-DMA/HDDA systems with and without tertiary triethyl amine (TEA) were investigated using photo-DSC under air and nitrogen atmospheres. Photo-DSC analysis revealed that N2 purging and the presence of TEA mitigated oxygen inhibition in the photopolymerization of the UV-curable free-radical PFPE-DMA/ HDDA system. In addition, TEA synergistically acted as a coinitiator or photosynergist under nitrogen atmosphere, which increased the cure rate and percentage conversion for the photopolymerization of PFPE-DMA/ HDDA. TEA acted as both oxygen scavenger and photosynergist. The results presented here demonstrate that investigating the photocuring behaviors of PFPE-DMA/HDDA systems is very helpful to determine the optimal curing conditions for the PFPE-DMA fluoropolymer.
%K Fluoropolymer %K Photocuring Behaviors %K Oxygen Inhibition %K Photosynergist %U http://www.scirp.org/journal/PaperInformation.aspx?PaperID=41379