%0 Journal Article
%T Model for a UV Laser Based Local Polymer Surface Halogenation Process Using a Gaseous Precursor
%A Simon Kibben
%J Modeling and Numerical Simulation of Material Science
%P 14-19
%@ 2164-5353
%D 2014
%I Scientific Research Publishing
%R 10.4236/mnsms.2014.41003
%X An analytical model describing the physical relations of a UV-based process for halogenation of polymeric surfaces is presented. The process allows, depending on the parameters, a local halogenation with sharp edges at the interfaces to areas where no halogenation is desired. This is achieved via a nonreactive halogen-containing gaseous precursor and a UV source providing photons which dissociate the precursor photolytically. Thus, only where the UV photons affect the precursor, halogens are generated and the polymer is being halogenated.
%K Local Surface Halogenation
%K Polymer Modification
%K UV-Laser-Based Surface Modification
%U http://www.scirp.org/journal/PaperInformation.aspx?PaperID=41682