%0 Journal Article
%T Preparation of Cr2O3-Ta2O5 Composites Using RF Magnetron Sputtering
%A Kenta Miura
%A Takumi Osawa
%A Yuya Yokota
%A Osamu Hanaizumi
%J Open Access Library Journal
%V 2
%N 12
%P 1-5
%@ 2333-9721
%D 2015
%I Open Access Library
%R 10.4236/oalib.1102094
%X We prepared Cr2O3-Ta2O5 composite films using our RF magnetron co-sputtering method for the first time.
X-ray diffraction (XRD) patterns and photoluminescence (PL) spectra of the
films annealed at 700¡æ, 800¡æ, 900¡æ, and 1000¡æ were evaluated. From their XRD
patterns, the Cr2O3- Ta2O5 film
annealed at 700¡æ seemed to be
almost amorphous, and the one annealed at 800¡æ seemed to be hexagonal Ta2O5 doped with Cr. In
addition, the Cr2O3-Ta2O5 films
annealed at 900¡æ and 1000¡æ seemed to include tetragonal CrTaO4 phases. Furthermore, it
seems that almost no defect exists in our Cr2O3-Ta2O5 composite films annealed at 700¡æ - 1000¡æ because their PL spectra have no
defect-related peak. We thus find that good-quality Cr2O3-Ta2O5 composite films including CrTaO4 can be obtained
using our very simple co-sputtering method and subsequent annealing above
900¡æ.
%K Ta2O5
%K Cr2O3
%K Co-Sputtering
%K X-Ray Diffraction
%K Photoluminescence
%U http://www.oalib.com/paper/3152321