%0 Journal Article %T Preparation of Cr2O3-Ta2O5 Composites Using RF Magnetron Sputtering %A Kenta Miura %A Takumi Osawa %A Yuya Yokota %A Osamu Hanaizumi %J Open Access Library Journal %V 2 %N 12 %P 1-5 %@ 2333-9721 %D 2015 %I Open Access Library %R 10.4236/oalib.1102094 %X We prepared Cr2O3-Ta2O5 composite films using our RF magnetron co-sputtering method for the first time. X-ray diffraction (XRD) patterns and photoluminescence (PL) spectra of the films annealed at 700¡æ, 800¡æ, 900¡æ, and 1000¡æ were evaluated. From their XRD patterns, the Cr2O3- Ta2O5 film annealed at 700¡æ seemed to be almost amorphous, and the one annealed at 800¡æ seemed to be hexagonal Ta2O5 doped with Cr. In addition, the Cr2O3-Ta2O5 films annealed at 900¡æ and 1000¡æ seemed to include tetragonal CrTaO4 phases. Furthermore, it seems that almost no defect exists in our Cr2O3-Ta2O5 composite films annealed at 700¡æ - 1000¡æ because their PL spectra have no defect-related peak. We thus find that good-quality Cr2O3-Ta2O5 composite films including CrTaO4 can be obtained using our very simple co-sputtering method and subsequent annealing above 900¡æ. %K Ta2O5 %K Cr2O3 %K Co-Sputtering %K X-Ray Diffraction %K Photoluminescence %U http://www.oalib.com/paper/3152321