%0 Journal Article
%T 退火温度对Cr掺杂ZnO薄膜的微结构与机械性能的影响研究<br>Study on the influence of annealing temperature on mechanical property and microstructure of Cr doped ZnO films
%A 方新
%A 方新
%J 原子与分子物理学报
%D 2019
%X 本研究利用射频磁控溅镀法在玻璃基板上制备3 at.%的Cr掺杂ZnO薄膜，再以300 ℃ ？ 500 ℃温度退火处理25 mins，并探讨了退火温度对Al掺杂ZnO薄膜的微观结构与机械性能的影响。微观结构分析结果表明Cr掺杂ZnO薄膜的结晶方向为(002)，且沿(002)方向的成长随退火温度升高而越加明显，但薄膜的表面却随退火温度升高而变得越来越粗糙。机械性能分析结果揭示晶粒尺寸随退火温度升高而增大，导致差排原子的动能随之降低，致使Cr掺杂ZnO薄膜的硬度随退火温度升高而增大，但对其对杨氏模量却没有太大的影响；此外，Cr掺杂ZnO薄膜的耐磨性与韧性均随退火温度升高而增强，表明退火处理对该薄膜的抗塑性形变能力有很大帮助。<br>The 3 at. % Cr doped ZnO films were deposited on glass substrate by radio frequency magnetron sputtering method, followed by annealing process with temperature 300 ℃ ？ 500 ℃ for 25 minutes. And the influence of annealing temperature on mechanical property and microstructure of Cr doped ZnO films was investigated. The microstructure analysis result showed that the crystallization direction of Cr doped ZnO films is along (002) and the growth along (002) plane becomes more and more obvious with annealing temperature increasing. However, the surface roughness of the films becomes greater increasing with annealing temperature increasing. The mechanical analysis result revealed that the dislocation atomic energy can be decreased due to the grain size is larger with annealing temperature increasing and then the hardness of Cr doped ZnO films is thereupon great increasingly, but it has no significant effect on the Young modulus. Moreover, the wear resistance and toughness of the films are both increasing with annealing temperature increasing, which the annealing treatment plays an important role in improving the anti- plastic deformation ability of Cr doped ZnO films.
%K 氧化锌薄膜 铬掺杂 射频磁控溅镀 退火 微结构 机械性能&lt
%K br&gt
%K ZnO films Cr doping RF magnetron sputtering Annealing Microstructure Mechanical property
%U http://jamp.ijournals.cn/jamp/ch/reader/view_abstract.aspx?file_no=17175&flag=1