%0 Journal Article
%T 碲化铋基薄膜热电性能的研究<br>Study on the Thermoelectric Properties of Bi<sub>2</sub>Te<sub>3</sub>-Based Thin Films
%A 耿志挺
%A 蒋昱奇
%A 刘亦谦
%J Advances in Material Chemistry
%P 59-65
%@ 2331-0146
%D 2021
%I Hans Publishing
%R 10.12677/AMC.2021.92007
%X <div style=\"text-align:justify;\">
	热电材料能实现热能与电能间的相互转化，有很大的应用价值。碲化铋是研究最早、应用最广的热电材料。本实验采用了磁控溅射的方法，以不同的溅射功率与溅射时间在玻璃基板上得到了6片碲化铋热电薄膜。实验测定了6片薄膜的Seebeck系数与膜厚，观察了其表面形貌，并统一进行了热处理，且在热处理后重新测定了Seebeck系数、XRD图谱，并记录了表面形貌。结果表明，热处理后，薄膜的结晶程度与Seebeck系数均显著提升，总体的热电性能有了大幅提高。其中，在80 W的溅射功率下溅射10至25分钟，可以得到热电性能较好的碲化铋薄膜，有较大的功率因子。<br />
Thermoelectric materials can realize the mutual conversion between thermal energy and electric energy, which has great application value. Bismuth telluride (Bi2Te3) is the earliest research and most widely used thermoelectric material. In this paper, the magnetron sputtering method is used to obtain 6 pieces of Bi2Te3 thermoelectric film on the glass substrate with different sputtering power and sputtering time. The Seebeck coefficient and film thickness of 6 films were measured experimentally, the surface morphology was observed, and the heat treatment was performed uniformly. After the heat treatment, the Seebeck coefficient and XRD pattern were re-determined, and the surface morphology was recorded. The results show that after heat treatment, the crystallinity and Seebeck coefficient of the film are significantly improved, and the overall thermoelectric performance is greatly improved. Among them, by sputtering under 80W sputtering power for 10 to 25 minutes, a bismuth telluride film with better thermoelectric properties can be obtained, and a higher power factor can be obtained.
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%K 磁控溅射，碲化铋，热电薄膜<br>Magnetron Sputtering
%K Bi2Te3
%K Thermoelectric Thin Films
%U http://www.hanspub.org/journal/PaperInformation.aspx?PaperID=41713