Caracterización estructural y óptica de compósitos ZnO-SiOx obtenidos por la técnica Cat-CVD

zinc oxide- non-stoichiometric silicon dioxide (zno-siox) composites were obtained by catalytic chemical vapor deposition (cat-cvd) technique at 950 0c. the experiments were carried out in the range of 800-1100 0c. from x-ray diffraction (xrd) and fourier transformed infrared spectroscopy (ftir) analyses, we found that pure zno phase is obtained at 800 0c. it was observed that increasing deposit temperature, the structure of deposited material is beginning to be dominated by siox until to 1100 0c, single amorphous siox phase is obtained. however, it was found an intermediate temperature (950 0c) to obtain zno-siox composite. the gradually phase shift was attributed to both zinc (zn) re-evaporation, and increased surface mobility of silicon (si) atoms. photoluminescence (pl) spectra showed two emission bands: one from 450 until 700 nm, and the other, a broad band from 600 to 1100 nm approximately. these emissions are generally related with oxygen vacancies (vo) in zno and si nanocrystals in siox.