Realization of ZnO/PVK transparent heterojunction by solution processing routes

In this work, transparent heterojunction between zinc oxide (ZnO) and poly(N-vinyl carbazole) (PVK) was fabricated by solution processing techniques such as spin-coating and dip-coating techniques; then, its performance was studied using current (I)-voltage (V) measurement at room temperature. Before fabricating the heterojunction, initially, the growth characteristics of both thin films were independently optimized on a well-cleaned glass substrate, then its structural properties, optical properties, and surface topography were characterized using an X-ray diffractometer, UV-VIS-NIR spectrophotometer, and atomic force microscope, respectively. The structural analysis confirms the existence of a PVK thin film in amorphous nature and ZnO thin film in hexagonal crystal structure. The transparent nature of the heterojunction was found to be more than 85% in the visible and NIR regions with the absorption onset in the ultraviolet region. The observed experimental results explored the possibilities of fabricating ZnO/PVK transparent heterojunction by solution-based routes on a transparent fluorine-doped tin oxide substrate for transparent electronics applications.