Synthesis and Characterization of ZrO2 Thin Films

Zirconia thin films with thicknesses of 40-120 nm on glass, single-crystal silicon, quartz, polycor, and sapphire substrates have been prepared from zirconium oxochloride and ethanol FFSs. The physicochemical processes involved in film formation and the phase composition and properties of the films have been studied. The films prepared on glass or quartz are amorphous; those on silicon, polycor, or sapphire have a crystal structure. The resulting ZrO2 films have refractive index indicator 1,86 – 2,08, are insulators, with high indicators of bandgap width 5,0 – 5,2 eV, absorption edge is limited by 220 nM, which allows to use it as reallot light covering.