Optimization of anodized aluminum oxide pore morphology for GaAs nanowire growth

Anodic Aluminum oxide films were produced by anodization of sputtered Aluminum thin films on Silicon substrates. The effects of anodization voltage and aqueous oxalic acid solution on the pore diameter and interpore distance were studied. Parameters were sequentially varied to optimize the pore uniformity. Pore morphology was most uniform at 40V anodization voltage and 0.3M solution concentration. Average pore diameter and interpore distance for these parameters are 26.14nm ± 13% and 74.62 ± 8%, respectively. Pore diameter uniformity was further improved by etching with phosphoric acid solution. The AAO films were also successfully used to pattern gold nanoparticle catalysts for the synthesis of semiconductor nanowires.