Bipolar Pulsed-DC Power Supply for Magnetron Sputtering and Thin Films Synthesis

A pulsed-dc power supply has been designed and constructed for use in a magnetron sputtering system and forthin film synthesis. The power supply consists of three major parts: (1) two high voltage direct current (dc) power suppliesutilizing a phase control circuit for power delivery, (2) pulse generator and two power switching circuits, and (3) feedbackcircuits for current and voltage controls, displays, and safety measures. For a high level of safety operation, opticalconnections were employed in the circuit design for complete isolation between low and high voltage sections. Theconstructed power supply was tested using a test load consisting of ten 100 W 250 V light bulbs with tungsten filamentsconnected in series. It was found that the power supply was capable of supplying either symmetric or asymmetric pulsed-dcpower of maximum peak-to-peak voltage of 1250 V. The negative and positive pulse widths were selectable between 10-100 μs, with maximum pulse frequency of 30 kHz. This frequency limit is due to the limited speed of the power transistors used in the power switching circuit operating at high voltage. It is anticipated that the constructed power supply can be used as a plasma generator in a magnetron sputtering system for the deposition of oxide thin films such as Al2O3, NaxCo2O4, ITO and ZnO.