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Laser Produced Plasma X-Ray Sources for Nanoscale Resolution Contact Microscopy: A Candidate in Cancerous Stem Cells Imaging

DOI: 10.4236/ami.2017.74004, PP. 67-77

Keywords: Laser Plasmas, Contact Microscopy, Laser Ablation, Water Window X-Rays, PMMA Photoresist, Mass Ablation Rate, Exposure Depth

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Abstract:

Plasma X-ray sources for biological microscopy have been produced by focusing single shots from Nd:glass laser onto carbon rod targets at irradiances between 1 × 1013 Wcm2 and 3 × 1013 Wcm2 to expose test objects. The optimum parameters needed for obtaining high accurate information on the samples under test namely: the minimum energies and irradiances at a range of angles between the incoming laser beam and the normal to the resist, the depth of exposure of the photoresist as a function of incident laser energy (and irradiance) were concluded in this work.

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