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Factors Enhancing Production of Multicharged Ion Sources and Their ApplicationsDOI: 10.5923/j.scit.20120204.07 Keywords: Multicharged Ions, ECR Ion Sources, Laser Ion Sources, PIG sources Abstract: In this article, Principle of plasma generation is discussed and investigated. In all types of ion sources, ions are produced by various types of gas discharge including electron collisions with gas particles. The general parameters are a source of electrons, a small region of relatively high gas pressure, an electric field to accelerate the electrons in order to produce an intense gas discharge (plasma) with a relatively high electron and ions density and some mechanism for extracting a collimated parallel high current ion beam. Our research work was quickly described, reviewed and gave some results showing the importance in some areas of applications. A short historical review on basics and applications of some multicharged ion sources is presented. The multicharged ion source is evaluated by; the large ion current extracted from it, the large percentage of ions in the beam, the higher degree of ionization inside the atom, the small gas consumptions, and the degree of divergence of the extracted ions must be small.
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